When annealing temperature was varied in the range of 200~ 600 ℃, the films have a good thermal stability. 在退火温度小于600℃范围内,类金刚石膜的热稳定性较好;
And the higher the annealing temperature is, the better the optical homogeneity is in the temperature range of the experiments. 在实验温度范围内,退火温度越高,质量改善越明显。
For the temperature of 300~ 400 ℃, the magnetic properties vary sensitively with the annealing temperature, and the increment of permeability is about 76% in the temperature range. 当温度在300~400℃之间,磁粉芯性能随着退火温度的升高显著改善,在此区间磁粉芯磁导率提高76%;
The annealing behaviors of PMOS Dosimeters with various gate biases over a wide temperature range have been investigated. 研究了PMOS剂量计在不同温度和栅偏置下的辐照退火表现。
Mn atomic can significantly increased re-crystallization temperature of aluminum alloy. Mn element precipitated after homogenization annealing, reduced the re-crystallization temperature and the re-crystallization range expanded because of the low temperature re-crystallization rate. 同时Mn原子能显著提高铝合金再结晶温度,均匀化退火后Mn元素析出,降低了再结晶温度,并且低温再结晶速度小,扩大了再结晶区间。
Then the three factors ( except the primers), template concentration and annealing temperature were further optimized in a small range so that we could got the final optimized systems. 在此基础之上对这3个因素(除了引物)和模板浓度、退火温度进一步小范围水平内的微调优化,得到最终的优化体系。